The leak-tight Performance Optimizers for Medium and High Vacuum Applications
Reliable
Special lobe design to prevent powder and particle deposits, robust construction made of GGG40 material, leak-tight
High performance
Specially designed for harsh applications in the medium and high vacuum range, including semiconductor processes with powder and dust, excellent volumetric efficiency
Flexible
Reliable performance under varying operating conditions, boosts the performance of all types of backing pumps
Technical specifications
Markets & applications
Flat panel display production
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Plasma-enhanced chemical vapor deposition (PECVD)
Semiconductor production
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Harsh
Solar power industry
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Plasma-enhanced chemical vapor deposition (PECVD)