The Leak-Tight Performance Optimizers for Medium and High Vacuum Applications
Solid lobe design, robust construction, reliable under varying operating conditions, leak-tight, barrier gas connection
Excellent volumetric efficiency, high ultimate pressure, increases the performance of a vacuum system by up to a factor of ten, integrated bypass valve, specially designed for medium and high vacuum applications including semiconductor processes
Can be flanged directly on the system at any position, boosts the performance of all types of backing pumps, with vertical or lateral discharge
Markets & applications
Plasma-enhanced chemical vapor deposition (PECVD)
ATEX - for use in explosion hazard areas.